Glancing Angle Deposition (GLAD) is creating great interest in areas where structured three-dimensional deposition is required. Based on UHV Design’s highly successful EpiCentre range, the GLAD stage provides an in-line solution (as with
the EC-I Series) but with the addition of substrate tilt. Being an in-line stage, a large range of axial (Z) motion can be provided.
By precisely controlling the polar and azimuthal rotations simultaneously,
novel structures can be grown, which have, for example, columnular
morphology or a nano-helical structure or are structured via anisotropic
shadowing. Such materials have applications in many highly topical fields
such as photonics, catalysis, bio-compatible materials and fuel cells.
Being fully UHV compatible, the GLAD stage is eminently suitable for use with all the usual directional deposition sources, such as thermal evaporation, physical vapour deposition, pulsed laser deposition and magnetron sputtering.